Author: M. Edward Motamedi,Leo Beiser
Publisher: Society of Photo Optical; 1st Edition edition (June 1, 1995)
Size Fb2: 1426 kb
Size ePub: 1880 kb
Size Djvu: 1365 kb
Other formats: azw mbr lit lrf
as Want to Read: Want to Read savin. ant to Read. Details (if other): Cancel.
Show Author Affiliations. Zhixin Li, Ferrofluidics Corp.
An effective and universally useful means of adjustment in the realm of precision engineering and optics became possible with the realization of a new driving mechanism.
Read Abstract +. Polysilicon microbeams in integral vacuum enclosures on silicon substrates have optical and mechanical properties that provide excellent opportunities for fiber-optic sensors. The microbeam, shell, and silicon substrate form a structure with Fabry-Perot-like properties that functions as an optomechanical modulator. An effective and universally useful means of adjustment in the realm of precision engineering and optics became possible with the realization of a new driving mechanism.
43. Hjort . Söderkvist . and Schweitz .
Compare Price San Jose - Shopping Now on Online Store.
Harrington, James A. and Harris, David M. and Katzir, Abraham. and Society of Photo-optical Instrumentation Engineers (. Harrington, James A. & Harris, David M. & Katzir, Abraham. amp; Society of Photo-optical Instrumentation Engineers (.
Technology: General Issues. Micro Optics Micromechanics & Laser Scanning. Proceedings of Spie-The International Society for Optical Engineering, V. 2383. By (author) Leo Beiser, By (author) M. Edward Motamedi.
This PDF file contains the front matter associated with SPIE Proceedings Volume 7361, including the .
Do you want to read the rest of this article? Request full-text. The contamination of optical surfaces by photon irradiation in the presence of background vacuum gases shortens optics lifetime and is one of the main concerns for reflection optics used in conjunction with intense light sources, such as high power lasers, 3rd and 4th generation synchrotron sources or plasma sources used in extreme ultraviolet lithography (EUVL) tools.