SPIE 1925, Advances in Resist Technology and Processing X, pg 2 (15 September 1993); doi: 1. 117/12. Purchase complete book on SPIE.
SPIE 1925, Advances in Resist Technology and Processing X, pg 2 (15 September 1993); doi: 1. Read Abstract +. This paper describes a method to measure acid diffusion in different negative I-line resist systems. Delay-time effects between exposure and post-exposure bake in acetal-based deep-UV photoresists. Horst Roeschert; Charlotte Eckes; Hajime Endo; Yoshiaki Kinoshita; Takanori Kudo; Seiya Masuda; Hiroshi Okazaki; Munirathna Padmanaban; Klaus Juergen Przybilla;et.
154789 Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States. Veena Rao, William D. Hinsberg, Curtis W. Frank, Roger Fabian W. Pease, "Influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists," Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); Include: Citation Only.
Author(s): William D. Hinsberg; Scott A. MacDonald; Lester A. Pederson; C. Grant . Conference Proceedings. Browse by Volume Number. Grant Willson. SPIE 0920, Advances in Resist Technology and Processing V, (1 January 1988); doi: 1. Show Author Affiliations.
SPIE 4345, Advances in Resist Technology and Processing XVIII, pg 1 (24 August 2001); doi: 1. We describe here experiments aimed at probing the interfacial behavior of thin polymer films during dissolution. Mechanistic understanding of line-end shortening. Michael D. Stewart; Gerard M. Schmid; Sergei V. Postnikov; C. SPIE 4345, Advances in Resist Technology and Processing XVIII, pg 10 (24 August 2001); doi: 1.
New photoresists are needed to advance extreme ultraviolet (EUV) lithography. The tailored design of efficient photoresists is enabled by a fundamental understanding of EUV induced chemistry. Processes that occur in the resist film after absorption of an EUV photon are discussed, and a new approach to study these processes on a fundamental level is described. The processes of photoabsorption, electron emission, and molecular fragmentation were studied experimentally in the gas-phase on analogs of the monomer units employed in chemically amplified EUV resists.
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Hinsberg, William . MacDonald, Scott . Pederson, . Willson, C. Zero-Misalignment Lithographic Process Using a Photoresist with Wavelength-Selected Tone, Advances in Resist Technology and Processing V, Proc. SPIE 920 2-12 (1988). Hinsberg, W. MacDonald, S. G. Self-Aligning Lithography using a Dual-Tone Resist: A Lithographic Analogue of Color Photography, Photo.
Advances In Resist Technology And Processing X - ISBNdb (books and publications). author: William Hinsberg. William Hinsberg Social Networks Profiles.